摘要
为适应九十年代甚大规模(ULSI)集成电路水质要求,各国均在探讨纯水制造的新工艺模式.本文简略报道两种兆位级高纯水系统和有关制造技术的进展.
To satisfy the water quality demand for ultra-large scale integrated circuits (ULSI) manufacture in 1990s, new technologies of pure water preparation are being developed worldwide. Two pure water systems to prepare water with resistances over megaohms and informations on pure water preparation advances are presented in this paper.
出处
《给水排水》
CSCD
1995年第5期16-19,共4页
Water & Wastewater Engineering
