Ar气压强对溅射沉积的W／Si多层膜界面粗糙度的影响

THE EFFECT OF Ar PRESSURE ON INTERFACIAL ROUGHNESS FORW/Si MULTILAYERS

本文用磁控溅射方法制备了不同Ａｒ气压强下的Ｗ／Ｓｉ多层薄膜，并用小角Ｘ－射线衍射方法分析了膜层的周期结构和界面粗糙度，发现随Ａｒ气压强的增加界面粗糙度明显增加。文中对这一现象用成膜动力学理论进行了讨论。

W/Si multilayers were deposited by magnetron sputtering in an Ar atmosphere at different pres-sures。A study of interfacial roughness has been carried out using low-angle x-ray diffraction.Theresults showed that interfacial roughness increased with the increflse of Ar pressure。The effect of Arpressures on interfacial roughness is discussed。