SnO_2薄膜的脉冲激光沉积

Pulsed Laser Deposition of SnO_2 Thin Films

采用脉冲激光沉积技术制备了ＳｎＯ２薄膜。Ｘ射线衍射结构分析表明薄膜为非晶态。在６００℃温度下退火后，由非晶薄膜转变为多晶薄膜。研究了多晶ＳｎＯ２薄膜的光电特性。在４００ｎｍ至７００ｎｍ的可见光范围内，其透过率保持在７０％到９０％。电阻率为１．９×１０－１Ωｃｍ。

The tin dioxide thin films are deposited by pulsed laser ablation. The x-ray diffraction results show that the films deposited by this method are amorphous. It is also observed from the x-ray diffraction result that the film becomes polycrystalline after annealing at 600℃ Optical and electrical properties of the polycrystalline films have been investigated. The transmittivity of the film remains 70%-80% from 400nm to 700nm. The resistivity of the film is about 1.9 ×10-1Ω cm.