高灵敏四阶导数光谱PLS法同时测定钨钼钛

SIMULTANEOUS DETERMINATION OF TUNGSTEN,MOLYBDENUM AND TITANIUM BY FOURTH DERIVATIVE SPECTRA WITH PARTIAL LEAST SQUARES METHOD

本文首次用偏最小二乘（ＰＬＳ）法对ＳＡＦ－ＣＴＭＡＢ－Ｗ，Ｍｏ，Ｔｉ混合显色体系的四阶导数光谱进行解析，提出了同时测定痕量钨、钼、钛的计算分析方法。在０．５ｍｏｌ／ＬＨＣｌ介质中，Ｗ，Ｍｏ，Ｔｉ的ＳＡＦ－ＣＴＭＡＢ显色体系的四阶导数光谱摩尔响应系数（双峰）分别为２．３×１０６，２．１×１０６和５．９×１０５，比常规光度法高出４．５～１６．８倍。该法用于合成样品和钢样中钨、钼、钛的同时测定，相对误差在±８％以内。

The 4th-derivative spectra of the mixed color system of SAF-CTMAB- (W, Mo,Ti) are analysed by partial least squares(PLS) method, and the computerized analysis for the simultaneous determination of trace tungsten, molybdenum and titanium is described. In the medium of 0.5mol/L HCl, the molar responsive coefficients of 4th-derivative spectra, which are 4,5-16. 8 times as high as that of routine spectrophotometry, in the systems of SAF-CTMAB-W, Mo, Ti are respectively 2. 3× 106, 2. 1× 106 and 5. 9 × 105. The method has been applied to the simultaneous determination of tungsten, molybdenum and titanium in artificial and steel samples, and the relative errors are with in ±8%.