摘要
本文首次提出了双镀层振幅型高温云纹光栅的制作工艺，并应用此工艺在铍青铜、不锈钢材料上制作高温栅，并且分别进行了５５０℃长时间氧化实验和７５０℃的短时间氧化实验，实验结果表明，此工艺是可行的。
In this paper,a new method for forming two-deposited layers amplitude grating for high temperature is put forward.Some high temperature tests up to 750℃ were conducted for measuring the oxidation resist abilities of this grating. The successful experimental results verifies this method is feasi-ble.
出处
《光学技术》
CAS
CSCD
1995年第5期7-10,共4页
Optical Technique
关键词
高温云纹光栅
云纹法
光刻法
制作工艺
amplitude Moire grating for high temperature,Moire method,photoetching method.
