摘要
使用本实验室研制的整体平行束软Ｘ光透镜作为准直器和电子枪软Ｘ光源相配，作成了平行束软Ｘ光源，用此平行束软Ｘ光源进行了深亚微米Ｘ射线光刻实验．刻出了１．０μｍ～０．２μｍ的线条．文中对实验装置和光刻结果作了简要的介绍。
With combination of a parallel beam soft X-ray lens used as an X-ray beam collimatorand an electron gun soft X-ray generator,a parallel soft X-ray source was developed for deepsubmicron X-ray lithography in the X-ray laboratory of Beijing Normal university.A testinglithography experiment was carried out by using this source and 0.2 1.0μm lines wereobserved.The experimental setup and preliminary resuIts of X-ray lithography is describedbriefly in this report.
出处
《光学精密工程》
EI
CAS
CSCD
1995年第4期62-65,共4页
Optics and Precision Engineering
基金
中国航天总公司资助项目
