激光等离子体软X射线接近式光刻术初步研究

Preliminary Study of Laser Soft X-Ray Approach Lithography

描述了用高功率脉冲激光打靶产生的等离子体作为软Ｘ射线源而进行的接近式软Ｘ射线光刻研究。采用负性辐射线光刻胶聚氯甲基苯乙烯（ＰＣＭＳ），得到了一些新的实验结果。

Using high- power pulsed laser- produced plasma as soft X- ray source for approach lithography is described in this paper. By applying negative resist PCMS, some new experimental results are obtained.