MOCVD装置的微机控制

A CONTROL SYSTEM BASED AN MICROCOMPUTER FOR MOCVD

本文叙述了一个MOCVD装置的微计算机控制系统.控制系统包括微计算机接口、每一种气体质量流量控制、各种有机源的温度控制、射频加热感应器的温度控制、多通道气体开关和屏幕指示等.

This paper describes a control system for MOCVD by the use of a microcomputer. The MOCVD is a metal-organic chemical vapor deposition (MOCVD) system specifically designed for developing epitaxial layers of gallium-arsenide and other Ⅲ-Ⅴ/Ⅱ-Ⅵ semiconductor compound materials. It is also useful for the investigation of super-lattice.The control system consists of a microcomputer interface, a mass flow control for each gas, a temperature control for the baths for each metal-organic source, a temperature control for EF-heated susceptor, a gas switching manifold, a gas panel and so on.The accuracy of the temperature control for the RF-heated susoeptor is 0.05%, The error of the temperature control for metal-organic baths is about-15±0.01 °C.The fully automated process control is achieved in a safe, accurate manner by the use of the control system based on a microcomputer under any adverse circumstance.