用相移掩模光刻技术制作大相对孔径二元透镜的研究

THE STUDY OF MANUFACTURING LARGE NA BINARY LENS USING THE PHASE-SHIFT PHOTOLITHOGRAPHY

简述相移掩模的基本原理，提出了用相移掩模光刻技术制作大相对孔径的二元透镜的设想。通过数值模拟对相移掩模光刻技术做了探讨，给出了适合国内ｇ－线光刻机的相移掩模的设计参数。

phase-shift technology can improve greatly the resolution of the existing photolithography equipment. It privides a stronger technical tool for manufacturing binary optical elements and WLSI. The basic principle of phase-shift mask is introduced. The idea manufacturing large NA(numweical aperture) binary lens using the phase-shift photolithography is ptoposed. The phase-shift technology has been investigated through the computer simulation.The useful design parameter for developing phase-shift technology with domestic g-line projector will be given.