摘要
简述相移掩模的基本原理,提出了用相移掩模光刻技术制作大相对孔径的二元透镜的设想。通过数值模拟对相移掩模光刻技术做了探讨,给出了适合国内g-线光刻机的相移掩模的设计参数。
phase-shift technology can improve greatly the resolution of the existing photolithography equipment. It privides a stronger technical tool for manufacturing binary optical elements and WLSI. The basic principle of phase-shift mask is introduced. The idea manufacturing large NA(numweical aperture) binary lens using the phase-shift photolithography is ptoposed. The phase-shift technology has been investigated through the computer simulation.The useful design parameter for developing phase-shift technology with domestic g-line projector will be given.
出处
《北京师范大学学报(自然科学版)》
CAS
CSCD
1995年第3期348-352,共5页
Journal of Beijing Normal University(Natural Science)
基金
国家自然科学基金
关键词
相移掩模
光刻
透镜
二元透镜
制造
phase shifting mask
photolithography
binary optics
lens