摘要
研究了制备工艺对微波等离子体ＣＶＤ金刚石成膜质量的影响。详细讨论了基片在等离子体中的位置、基片台结构、Ｎ２等离子体预处理及启动条件对金刚石成膜均匀性的影响。提出了能获得均匀金刚石膜的制备工艺程序。
The influence of synthesising technology on the nucleation of diamond film deposited by microwaveplasma CVD was investigated. The effect of substrate's position in the plasma , substrate holder styles , H2plasma pretreatment and start-up conditions on diamond nucleation uniformity was discussed in detail. Fi-nally, a set of synthesis procedure to assure formation of uniform diamond film had been established.
出处
《航空材料学报》
CAS
CSCD
1995年第1期45-50,共6页
Journal of Aeronautical Materials
