摘要
对射频磁控溅射沉积的ＺｒＯ２－１２ｗｔ％Ｙ２Ｏ３薄膜进行了电子束处理和热退火处理．通过ＸＲＤ、ＸＰＳ、ＳＥＭ等的微观分析，研究了薄膜的相结构组成、薄膜主要组成元素的氧化态以及薄膜的形貌特征。并对以提高薄膜增韧性为目的而进行的后处理的方式选择作了讨论。
Post-treatment such as electron beam heating and thermal annealing, was usedfor the r.f. magnetron sputtering deposited ZrO2-12wt%Y2O3 films. Studies on phasecomposition, oxidized states of Zr, and characterized morphologies of the films beforeand after post-treatment were made with SEM, XRD and XPS, and the selection ofpost treatment to increase film's durability was also discussed.
出处
《核技术》
CAS
CSCD
北大核心
1995年第1期10-14,共5页
Nuclear Techniques
基金
国家自然科学基金
