离子束辅助沉积MoS_x膜的特性研究

Characteristics of Mos_x films deposited by ion beam assistance

从轰击离子种类、辅助沉积方式、不同衬底材料以及存放环境湿度等因素对离子束辅助沉积的ＭｏＳｘ膜特性的影响作了研究。

For MoSx films deposited by ion beam assistance, the effect of bombarded ion species, deposition mode, substrate materials and humidity of of store environment etc on the properties of these films has been studied. Experimental results indicated that the effect of these factors on films can not be ignored both in.the film's deposition and in uses.