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用PICTS研究非掺杂半绝缘CdTe的深能级 被引量:1

INVESTIGATEDEEP LEVELSIN UNDOPEDsEMI -INSULATING CdTeBYPICTS
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摘要 本文首次报道了采用光激电流瞬态谱(PICTS)研究非掺杂半绝缘CdTe的深能级。结果表明,晶体内部的深能级决定着半绝缘材料的电阻率,0.1~0.19eV深能级带是决定电阻率高低的重要因素;PICTS反映的是晶体内的深能级,与样品(111)CdTe的A、B面和表面光洁度关系不大。 In this paper,it is reported for the first time in China that deep lev-els in undoped semi-insulating CdTe have been investigated by the Photop-In-duced Current Transient Spectroscopy ( PICTS).Upon the test results,it is indicateded that the resistivity of the semi-insulating material is dependent on deep levels in single crystal, and the important factor on which the value of the resistivity is dependent is the 0.1~0.19eV band. Moreover,it is the deep levels in crvstal that have been distributed by the PICTS.and the test result does not have much to do with the A, B face and the finish of the sample.
机构地区 南开大学物理系
出处 《红外与激光技术》 EI CSCD 1995年第5期23-29,共7页
关键词 PICTS 深能级 半绝缘材料 碲化镉 瞬态谱 Photoinduced current Deep levels Semiinsulating CdTe
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  • 10李刚,桑文斌,闵嘉华,钱永彪,施朱斌,戴灵恩,赵岳.高阻In掺杂CdZnTe晶体缺陷能级的研究[J].无机材料学报,2008,23(5):1049-1053. 被引量:1

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