摘要
裂纹群干扰效应会引起裂纹应力强度因子(SIF)的强化和屏蔽。本文给出用光弹性法测定裂纹(SIF)的原理、方法和测定实例。并在此基础上提出了裂纹群干扰效应的一般规律。
Disturbed effect of multiple-crack may cause increase or decrease in stress intensity factor(SIF).The principle, means and some examples of SIF determination are presented by the photoelastic method, and the common rules of the disturbed effect of multiple-crack are given also.
关键词
裂纹群
干扰效应
光弹性法
测定
disturbed effect of multiple-crack
photoelasticity