摘要
基于流态化CVD制备超细复合粒子过程中的反应、成核、包敷、气流夹带,建立了流态化CVD反应器中描述超细粒子的粒度、分布及成核包敷、成膜包敷的一维过程模型。针对SnCl_4-H_2O-N_2体系包敷超细Al_2O_3粒子的过程,研究了反应器中SnO_2粒子的形成过程及操作参数对其在Al_2O_3粒子表面的淀积速率及形态的影响。结果表明,反应温度和SnCl_4浓度升高,包敷速率加快,包敷形态变差;背景气氛粘度增大,包敷形态变优,包敷速率减小;操作气速增大,包敷速率加快,包敷形态变优。
Based on the chemical reation,nucleation,coating and gas entraning in the flu-idization chemical vapor deposition reactor,one dimentional process model of particle size,film coating and nucleation coating was established.To the SnCl_4-H_2O-N_2 system,coating rate and morphology of SnO_2 with operating parameters were studied.The results showed that the coating rate increased with increasing reation temperature and SnCl_4 flux,but the coating morphology got worse with the gas viscosity increasing,the coating rate decreased but the coating morphology got better.
出处
《华东理工大学学报(自然科学版)》
CAS
CSCD
1995年第4期406-411,共6页
Journal of East China University of Science and Technology
基金
国家自然科学基金