摘要
现场采集PETEOS发射光谱,分析和研究用等离子体正硅酸乙酯淀积氧化硅反应的机理和产物,并初步探究如何达到工艺控制,应用于生产的问题。
This paper discusses the mechanism and result in the condition that the SiO2 films were deposited by plasma─enhanced with (C2H5O)4Si.Furthermore,the anthors try to find out the way to make them under the control of technology and apply them in the manufacture.
出处
《华东师范大学学报(自然科学版)》
CAS
CSCD
1995年第1期39-42,共4页
Journal of East China Normal University(Natural Science)
基金
上海科委自然科学基金