摘要
研究氯化铜溶液中多孔硅光致发光猝灭的机制.瞬态光致发光和傅里叶变换红外光谱表明钢-多孔硅界面电子态提供了非辐射复合的途径.
A study is made on the photoluminescence quenching of porous silicon in copper chloride solution,laying emphasis on the mec anism. As shown by transient photoluminescence and ourier-transform infrared absorption, the localized electronic state at Cu/porous silicon interface provides a way of nonradiative recombination.
出处
《华侨大学学报(自然科学版)》
CAS
1995年第2期141-144,共4页
Journal of Huaqiao University(Natural Science)
关键词
多孔硅
光硅发光猝灭
表面
界面
氯化铜
porous silicon,photoluminescence quenching,surface and interface,copper chloride