摘要
对在多弧离子镀膜机上采用Ｔｉ／Ａｌ机械复合靶沉积出（Ｔｉ，Ａｌ）Ｎ膜的组织形貌与结构进行了分析，结果表明，（Ｔｉ，Ａｌ）Ｎ膜具有（１１１）晶面的择优取向，仍保持着ＴｉＮ的结构特征，但（Ｔｉ，Ａｌ）Ｎ晶面间距小于ＴｉＮ的晶面间距．没有ＡｌＮ相出现，这是ＴｉＮ相优先于ＡｌＮ相形成的缘故。（Ｔｉ，Ａｌ）Ｎ薄膜上分布有针孔和三种不同形貌液滴颗粒。
The features and structures of (Ti,Al)N film deposited by multi arc ion with mechanic compound targets were analysed in this paper. The results showed that the (Ti,Al)N films have a preferred orientation on (111 ) crystal face and the structures are similar to the TiN films, but interplanar distance of (Ti,Al)N is smaller. There is no phase of AlN in the (Ti, Al)N films, because the Phase of TiN is formed prior that of AlN. There are some pinholes and three trpes of microdroplet in the (Ti,Al )N films.
出处
《机械工程材料》
CAS
CSCD
1995年第4期29-31,共3页
Materials For Mechanical Engineering
基金
国家教委博士点基金
