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溶液混合与界面渗透法制备聚噻吩衍生物聚酰亚胺导电复合材料的研究 被引量:1

Study on the Polythiophene Derivative /Polyimide Conductive Composite Prepared by Solution Blending and Contact Permeation Methods
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摘要 本文介绍了高分子溶液混合与界面渗透法制备导电高分子复合材料的方法并对复合材料的结构和性能进行了表征。十二烷基取代聚噻吩四氢呋喃溶液与聚酰亚胺酸N-甲基吡咯烷酮在一定时间界面的互相渗透,十二烷基取代聚噻吩可嵌入聚酰亚胺酸层中。在溶剂挥发后,用化学或加热的方法进行酰胺化而得到稳定的导电高分子复合膜。表面电阻率、热失重及扫描电镜分析表明,与溶液混合法相比,界面渗透法制备的复合材料具有良好导电性能和稳定性。 Conductive composite films by solution blending and contact permeation of the conducting guest species into the polyimide (PI) host were prepared, and their structure and properties were discussed in this study, A layer of poly (3-dodecyl thiophene) (p3ddt) was embedded at the surface of polyimide by permeation of t poly (3-dodecyl thiophene) (in tetrahydrofuran (THF)) into a solution of polyamic acid in n-methyl pyrrolidinone (NMP). After solvent evoparation, the resulting composites could be imidised thermally or chemically. As observed from the surface resistivity, thermogravimetry analysis (TGA) and scanning electron microscopy (SEM), compared to the composite from solution blending, the conducting composite from permeation exhibited higher conductivity and stability even after solvent extraction。
作者 王金伟 杨槐
出处 《材料科学与工程学报》 CAS CSCD 北大核心 2005年第4期484-486,共3页 Journal of Materials Science and Engineering
关键词 导电复合材料 溶液混合 界面渗透 聚噻吩衍生物 聚酰亚胺 conductive composites solution blending contacting permeation polythiophene derivatives polyimide
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  • 1王琪,高峻.通过分子复合和增塑制备新型高分子固体电解质[J].高分子材料科学与工程,1996,12(2):123-127. 被引量:2
  • 2[1]Magaraphan R.,Lilayuthalert W.,Sirivat A.,Schwank J.W.Preparation,structure,properties and thermal behavior of rigid-rod polyimide/montmorillonite nanocomposites[J].Compos.Sci.Technol.,2001,61:1253~1264.
  • 3[2]Hsiao S.H.,Chen Y.J.Structure-property study of polyimides derived from PMDA and BPDA dianhydrides with structurally different diamines[J].Euro.Polym.J.,2002,38:815~828.
  • 4[3]Niyogi S.,Adhikari B.Preparation and characterization of a polyimide membrane [J].Euro.Polym.J.,2002,38:1237~1243.
  • 5[4]Park I.S.,Ahn E.C.,Yu J.,Lee H.Y.Cohesive failure of the Cu/polyimide system[J].Mater.Sci.& Engin.A.,1999,282:137~144.
  • 6[5]Karamancheva I.,Stefov V.,Soptrajanov B.,Danev G.,Spasova E.,J.Assa.FTIR spectroscopy and FTIR microscopy of vacuum-evaporated polyimide thin films [J].Vib.Spectrosc.,Vibr.Spectr.,1999,19:369~374.
  • 7[6]Qu W.L.,Ko T.M.Studies of dielectric characteristics and surface energies of spin-coated polyimide films[J].J.Appl.Polym.Sci.,2001,82:1642~1652.
  • 8[7]Fukushima K.,Ikeda Y.,Hayashi T.,Kikuchi N.,Kusano E.,Kinbara A.Imidized organic thin films deposited on glass substrates[J].Thin Solid Films,2001,392:254~257.
  • 9[8]Dubey M.,Nema S.K.Alloys of polyimides with varying degree of crosslinking through antimony salts:mechanical properties characterization[J].Polymer,1999,40:5947~5951.
  • 10[9]Seo Y.,Jung C.,Jikei M.,Kakimoto M.Preparation and surface observation by scanning probe microscope of C60-containing polyimide Langmuir-Blodget film [J].Thin Solid Film,1997,311:272~276.

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  • 1赵慧慧,姬科举,许银松,黄正跟,戴振东.GNS/PMMA泡沫复合材料的制备及其电磁屏蔽性能[J].材料科学与工程学报,2014,32(3):358-365. 被引量:18
  • 2段玉平,刘顺华,管洪涛,张俊鸽.低频聚苯胺/硅橡胶复合材料屏蔽效能的分析[J].功能材料与器件学报,2005,11(3):357-362. 被引量:11
  • 3孙文通.贱金属电子浆料导电机理研究[J].电子元件与材料,1997,16(3):14-19. 被引量:25
  • 4Teng. Thick film electrostatic printing [solar cell fabrication- EC-. Electronic Components Conference, 1989.39: 681-684.
  • 5S. B. Rane, RK. Khanna, T. Seth, et al. Firing and Processing effects on microstructure of fritted silver thick film electrode materials for solar cells[J]. Materials Chemistry and Physics, 2003, 82: 237--245.
  • 6S. P. Wu. Preparation of ultrafine nickel copper bimetallic Powder for BM-E-MI.CC[J]. Microelectronics Journal, 2007, 38: 41-46.
  • 7Shuji S (), Masatoshi S, Masashi E, et al. Copper paste composition[P3. CN5035837, 1991-01-30.
  • 8Hiroji T, Nagaokakyo, Kanehito H, et al. Conductive copper paste[P]. CN5336301, 1994-08-09.
  • 9许丽清,朱宏.应用于氧化铝基板的厚膜钨导体浆料[J].Electron Powder Standarization & Measurement, 2003, 44:38.
  • 10Bernard J, Houivet D, El Fallah J, et al. Mg/TiO3 for Cu base metal muhilayer ceramic capacitors[J]. Eur Ceram Soe, 2004, 24- 1877-1883.

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