多元合金溅射问题的蒙特卡洛模拟

Monte Carlo Simulation of the Multi-component Alloy Sputtering

本文用蒙特卡洛方法对多元合金靶表面的原子逐一进行考查．表面的原子组成由计 算机按比例随机组成。原子的溅射几率由０～１之间的小数组成。是否溅射取决于计算 机产生的随机数．通过计算可以看到，由于各原子的溅射几率不同，表面出现溅射几率 低的原子富集。同时计算结果还告诉我们，不论各原子的溅射几率如何，在不考虑扩散 情况下，经过一段时间的溅射后，溅射出的原子比例与靶材的原子比例相同．由此得到 表面原子富集与溅射几率的关系为（以二元情况为例）Ａ：Ｂ＝ＰＢ：ＰＡ我们在用溅射法制 备超导薄膜中，证实了这一结论。

In this paper, the atom on. the target surface made of multi-component alloy is investigated one by one with the Monte Carlo method. The atomic composition of surface was built up by computer in the proportion. The sputtering probability of atom is composed of decimal number from O to 1. Sputtering or not is dependent on the random figure obtained by the computor.It can be seen by calculation that due to the different sputtering probability of various atom, there is atomic enrichment of sputtering probability on the surface. At the same time, the calculated result showed that in spite of the sputtering probability of various atom, out of the consideration of diffusion condition, after a period of sputtering,the sputtered atomic proportion is as same as that of target. Therefore the relation beween the enrichment of surface atom and sputtering probability is as follows (for example,the double component alloy) A: B = Pb: Pa during the preparation of super conducting film with the sputtering method, the conclusion was approved.