磁控溅射涂层抗磨蚀性的研究

Study on the Corrosion Resistance of the Film Deposited by Magnetron Sputtering

本文利用磁控溅射工艺，研究了两种铁基和两种镍基不锈钢靶材的薄膜在０．１、０．５ 和 １．０ＮＨ２ＳＯ４溶液中的磨蚀性，并与 ２Ｃｒ１３不锈钢和 ４５钢进行比较，结果表明： 磁控溅射薄膜在同浓度的硫酸中，其抗磨蚀性由好至差的顺序为： ２＃、３＃和 ４＃薄膜。 其中在１．０ＮＨ２ＳＯ４中，２Ｃｒ１３的磨蚀量比 ４＃薄膜的高出 ９３倍之多，４５钢的磨蚀量比 ４＃薄膜高出４４倍之多。还对薄膜的磨蚀机理进行了初步的探讨。

In this paper, with the magnetron sputtering process, we describe that the film corrosion of stainless steel which take two kinds of Fe substrate and two kinds of Ni substrate as target material in the 0. 1,0.5 and 1.0N H2SO4 solution, and compare that with 2Cr13 stainless steel and 45 steel. The result shows: In the same H2SO4 solution,the order from good to bad for the corrosion resistance of magnetron sputtering film is as follows, 2#, 3# and 4#. In 1.ON solution, corrosion of 2Cr 13 is 93 times more than that of 4# film, that of 45 steel is 44 times more than 4# film.The corrosion mechanism of film was primarily studied.