圆柱形磁控溅射源I-V特性的实验研究

Experimental Study on I-V Characteristics of Magnetron Sputtering Source

本文讨论了圆柱形磁控溅射源（简称溅射源）工作气体压强（Ｐ）对Ｉ－Ｖ特性的影 响；对溅射源Ｉ－Ｖ特性作了计算，为理论分析溅射源Ｉ－Ｖ特性提供了可能：并根据 计算和实验结果，给出了溅射源最佳工艺参数。

In this paper, we discuss the influence of operating pressure on I-V characteristics and calculated the I-V characteristics in the cylindrical Magnetron Sputtering Source. It is shown that calculated values are basically in agreement with those measured. This research makes it possible to analyse I-V characteristics in Cylindrical Magnetron Sputtering Source. According to the both of calculating and experimental results the optimum process parameters of the source are given.