期刊文献+

Optical broadband monitoring of thin film growth 被引量:1

Optical broadband monitoring of thin film growth
下载PDF
导出
摘要 This contribution is focused on applications of spectroscopic methods for the precise control of deposition processes. In this context, the present study gives a review on selected combinations of conventional and ion deposition techniques with different broadband online spectrophotometric systems. Besides two systems operating in the VIS- and NIR-spectral range in combination with ion processes, also a monochromator system developed for conventional deposition processes in the DUV/VUV-spectral range will be discussed. The considerations will be concluded by a comparison of the major advantages of the specific combinations of processes with online monitoring concepts and by a brief outlook concerning future challenges. This contribution is focused on applications of spectroscopic methods for the precise control of deposition processes. In this context, the present study gives a review on selected combinations of conventional and ion deposition techniques with different broadband online spectrophotometric systems. Besides two systems operating in the VIS- and NIR spectral range in combination with ion processes, also a monochromator system developed for conventional deposition processes in the DUV/VUV spectral range will be discussed. The considerations will be concluded by a comparison of the major advantages of the specific combinations of processes with online monitoring concepts and by a brief outlook concerning future challenges.
机构地区 Laser Zentrum Hannover
出处 《光学精密工程》 EI CAS CSCD 北大核心 2005年第4期403-412,共10页 Optics and Precision Engineering
关键词 宽带 光学涂覆技术 薄膜 分光镜 optical coating optical broadband monitoring ion assisted deposition ion beam sputtering DUV VUV
  • 相关文献

参考文献19

  • 1A.S.A.C.Diniz,C.J.Kiely.Crystallisation of indium-tin-oxide thin films[J].Renewable Enengy,2004,29:2037-2051.
  • 2B.Vidal,A.Fornier,E.Pelletier.Wideband optical monitoring of nonquarterwave multilayer filters[J].Appl.Opt.,1979,18:3851.
  • 3I.Powell,J.C.M.Zwinkels,et.al.Development of optical monitor for control of thin-film deposition[J].Appl.Opt.,1986,3645:25.
  • 4F.J.van Milligen,H.A.Macleod.Development of an automated scanning monochromator for monitoring thin films[J].Appl.Opt.,1985,24(12):1799-1802.
  • 5R.P.Netterfield,P.J.Martin,K.H.Müller,In-situ optical monitoring of thin film deposition[J].SPIE,1988,1012:10-15.
  • 6G.Emiliani,A.Piegari,E.Masetti.Fast scan spectrometer for monitoring of thin film optical properties[J].SPIE,1988,1012:35.
  • 7H.H.Bauer,E.Nüssler.In-situ optical multichannel spectrometer system[J].SPIE,1994,2253:423.
  • 8M.Tilsch,V.Scheuer,J.Staub,T.Tschudi.Direct optical monitoring instrument with double detection system for the control of multilayer systems from the visible to the near infrared[J].SPIE,1994,2253:414-422.
  • 9B.T.Sullivan,J.A.Dobrowolski.Deposition error compensation for optical multilayer coatings:II.Experimental results-sputtering system[J].Appl.Opt.,1993,32:2351.
  • 10K.Starke,T.GroB,D.Ristau.Rapid prototyping of optical thin film filters[J].Conference Optical and Infrared Thin Films.,SPIE,2000,4094:83-92.

同被引文献2

引证文献1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部