电沉析条件对钛合金表面液相沉积类金刚石薄膜的影响(英文)

Influence of deposition condition on diamond-like carbon films by liquid deposition on the surface of Ti alloy

在钛合金表面沉积类金刚石膜能改进钛合金的生物相容性,拓展其在人体植入材料中的应用。探讨了用液相电解沉积法在钛合金表面制备类金刚石薄膜的新方法。讨论了不同沉积条件对膜的影响。在1650和1850V时可以得到坚固的棕色膜。沉积36h后,膜厚基本不变。沉积膜的Raman谱图表明,在1650和1850V沉积得到的是类金刚石薄膜,而在2000V时无法得到类金刚石薄膜。对膜的XPS分析表明,其主要成份是碳。XPS谱还表明在1650V时得到的膜可以将钛合金表面完全覆盖,而在1850V时则不能。以SEM分析表明在1650和1850V时得到的膜是由粒径约为400nm的小颗粒组成,而在2000V时得到只是疏松结构。并对类金刚石膜及钛合金的血液相容性进行了比较。

Diamond-like carbon films deposited on surface of Ti alloy can improve hemo-compatibility of Ti alloy and enhance the application as body-implanted materials. In this paper, Influence of deposition condition on diamond-like carbon （DLC） films by liquid deposition on the surface of Ti alloy was discussed. Strong brown films were deposited under voltage of 1650V and 1850V. After 36h, the thickness of films was almost constant. Raman spectra indicated that films deposited under 1650v and 1850v were DLC films, but films under 2000V were not. XPS spectra showed that main composition of films was carbon. XPS spectra also showed that the films under1650V can cover the surface of Ti alloy completely, but films under 1850V cannot. SEM analysis indicated that films under 1650V and 1850V were made of small grain diameter of which was about 400nm, but under 2000V, only loosen structure can be seen. Blood-compatibility of DLC films and Ti alloy was compared.