摘要
简单说明了清洗技术在90～65nm节点技术阶段的新发展,着重介绍了一种新的清洗技术—低温冷凝清洗技术产生的背景、技术现状及其应用,对我国半导体清洗行业的未来发展提出建议。
This paper briefly explains the new development of cleaning technology in 90-65nm node technology, introduces the background, status and applications of a kind of new cleaning technology named cryogenic aerosol process and brings some advice.
出处
《电子工业专用设备》
2005年第8期13-15,28,共4页
Equipment for Electronic Products Manufacturing
