摘要
电子束扫描场的畸变校正是电子束曝光机的关键技术之一。在圆形束曝光机的研制中,首次开展了对电子束扫描场的校正工作。本文探讨了扫描场畸变表达式并叙述了获得最佳校正的途径。
The distortion correction of electron-beam scanning field is one of theimp'ortant techniques in electron-beam lithography machine.In making the largesized chips by electron-beam lithography machine,the field correction should beconsidered first.This paper studies mainly the expression of electron-beam scann-ing field distortions and describes the method of optimal corrections.
出处
《电工电能新技术》
CSCD
北大核心
1989年第1期51-53,共3页
Advanced Technology of Electrical Engineering and Energy
