低压等离子体结合热解法制备金刚石膜

Diamond Film Growth by Low DC Voltage Plasma CVD Method Assisted with Thermolysis

金刚石膜具有与天然金刚石相似的优异特性，预计会有十分广阔的应用前景．本文介绍了一种新颖的金刚石膜生长技术─—强流电子增强化学气相沉积法（ＩＥＣＶＤ），它结合了传统的热丝法和等离子体法各自的优点，成为一种具有较高生长速率，能够制备大面积均匀金刚石膜的技术．对用这种方法制备的金刚石膜进行了喇曼、扫描电镜和Ｘ－Ｒａｙ衍射分析，并对这项技术的优点作了阐述．

The synthetic diamond films have many superior properties like natural diamond so that they are pre-sumed to have a glorious future of potential applications.A novel technique was presented in this work,whichwas called Intense Electron-current Enhanced Chemical Vapor Deposition(IECVD).It possesses the advan-tages of both the conventional hot filament CVD and the plasma CVD so that it could prepare large area ho-mogeneous diamond film with higher growth rate. The diamond films synthesized with this method were char-acterized by Raman spectroscopy,SEM,and XRD.