苯乙烯等离子体聚合过程的发射光谱研究

Emission spectroscopic study of process parameter effects on plasma polymerization of styrene

为实现对聚合膜结构、性能的优化控制，通过测量苯乙烯等离子体辉光区和两极板鞘层区内的发射光谱，得到了ＣＨ、Ｃ４Ｈ２＋粒子发射强度与放电气压、功率的变化关系曲线，并以此研究了等离子体内部过程与膜结构、沉积速率之间的关系。研究结果表明，等离子体聚苯乙烯薄膜的沉积速率取决于等离子体中所产生的各种活性粒子（包括激发态分子、碎片自由基、离子等）的总数目；而聚合膜中的苯环含量，则与气相中含有苯环基团的那部分活性粒子数目相关。

Plasma polymerization has been recognized as a new process for producing materials. The goal of the present work was to get a deeper understanding of the plasma polymerization of styrene by means of emission spectroscopy. Emission spectra were measured inthree regions:the glow zone and the two sheaths in front of the electrodes. The plasma--polymerized styrene (PPS) thin films were analyzed with infrared spectroscopy. The effects ofdischarge parameters (power, pressure) on CH, emission intensities, the deposition rateand polymeric structure of the deposited films were studied. The results indicate that PPSthin film deposition rate is mainly dependent on the total number of various reactive speciesproduced in the plasma. The concentration of phenyl group in the deposited polymer is proportional to the relative concentration of the reactive species containing phenyl group in thegas phase plasma.