ITO膜的光谱选择性

SPECTRAL SELECTIVIES OF INDUIM AND TIN OXIDE(ITO)FILM

对磁控溅射制备的重掺杂ＩＴＯ膜的光谱选择性进行了研究。发现基片加热至３５０℃时沉积的ＩＴＯ膜，其光谱选择性透射和反射特性主要取决于沉积气氛中Ｏ２的含量。本实验中Ｏ２∶Ａｒ＝０．４时获得满意的结果。当基片处于自然升温时，沉积的ＩＴＯ膜的优良光谱选择性透过和反射特性，与沉积时氧气的量及膜在空气中的退火条件有关，在氧气含量约为０．０６时沉积的ＩＴＯ膜，经２５０℃、２５ｍｉｎ退火后，膜具有优良的选择性。

Spectral selectivies of ITO films deposited by dc reactive magnetron sputtering technique onto heated substrates depend on O2 partial pressure during deposition and also depend on post-deposition annealing conditions as well as deposition atmosphere for films deposited on unheated substrates.The films prepared in a sputtering atmosphere of O2/Ar=0.4 are found to have good spectral selective transmission and reflection.ITO films deposited at 0.06 O2 atmosphere after 25 minutes annealing at 250℃in air have satisfying selectivities.