摘要
本文对硅的电化学自致停腐蚀的原理作了简要分析，利用自制装置实现了硅电化学自致停腐蚀，成功制备出符合光波导要求的ＳＯＩ片。
The mechanism of electrochemical self-etch-stop etching of silicon is analyzed in the paper.Electrochemical self-etch-stop of Si has been achieved by using a device made by ourselves and SOI wafers suitable for optical waveguides have been successfully prepared using this tech- nique.
出处
《微电子学》
CAS
CSCD
1995年第3期44-46,共3页
Microelectronics
关键词
硅膜腐蚀
电化学腐蚀
硅
Silicon film etching,Electrochemical etching,Semiconductor process
