摘要
本文介绍了我校研制的矢量扫描电子束曝光机中，扫描场非正交性畸变的校正情况，该机器的偏转系统为内透镜双磁偏转方式。
The paper introduces a method of correction of non -orthogonal distortionin scanning field of a vactor scan electron-beam lithography machine which isdeveloped in our university. The deflecting system of the machine uses in -lens double magnetic deflection technique.
出处
《微细加工技术》
1995年第2期6-10,共5页
Microfabrication Technology
关键词
电子束曝光机
偏转系统
畸变校正
electron-beani lithography
deflection system
distortion correction
