摘要
采用I-V测试技术,研究了CMOS/BESOI器件的I-V亚阈特性与温度的关系。结果表明,随着温度的升高,I-V曲线的亚阈斜率减小,且阈电压漂移增加。
The relation between temperature and subthreshold characteristics of I-Vcurves ofCMOS/BESOI device were measured with I-V technique.It’s con-cluded that the subthreshold slope of I-V curve is decreasing with raising oftemperature and the drift of thresliold voltage is increasing.
出处
《微细加工技术》
1995年第3期41-43,共3页
Microfabrication Technology