Ar离子束作用下C_(60)薄膜的结构稳定性研究

The Stability of C_(60) Film Bombarded by Ar Ion Beam

利用XPS和AES研究了在Ar离子束作用下C60薄膜的分子结构的稳定性．研究发现C60分子与Ar离子束作用后，C1s结合能从284．7eV逐步下降到284．4eV，CKLL俄歇动能从270．0eV增加到271．3eV．并且C60薄膜在与氩离子束作用后，其C60分子结构特征的C1s携上峰及价带峰均消失．表明Ar离子束可以促使C60分子的C＝C双键断裂，离域π键消失，C60分子分解为单质碳．C＝C双键断裂过程与离子束的能量和辐照时间有一定的函数关系．

In this paper, the C60 film was deposited by vacuum evaporation at 450℃.The Stability of C60 film bombarded by Ar ion beam has been studied using XPS and AES.The results have shown that the film deposited by vacuum evaporation was very pure. It did not contain any oxygen inside C60 film. The shake-up peaks of C1s and valence band peaks were the character peaks of C60 melecule. After C60 film had been bombarded by Ar ion beam, the binding energy of C1s decreased from 284.7 eV to 284.4 eV, the kinetic energy of C KLL increased from 270.0 eV to 271.3 eV. The character peaks (C1s shake-up peaks and valence band peaks) disappeared after bombarded by Ar ion beam. The nature of action between C60 film and Ar ion beam was the decomposition of C60 molecule and the formation of pure carbon. Increasing the radiation time and energy of ion beam can increase the decomposition of C60 molecule.