咔唑氮氧自由基的光催化氧化产生及其机理

Study on the Generated Mechanism of Carbazole Nitroxyl Radical via Photocatalysis Oxidation of Carbazole

用ESR方法研究了吸附在半导体微粒表面的咔唑光催化氧化过程，得到较为稳定的咔唑氮氧自由基，其g值为2．0060,半衰期约为10～20min．实验表明，无论是光催化氧化还是光化夺氢后进行氧化，咔唑氮氧自由基的生成过程均为退化分支链反应过程．

ESR and spin trapping-ESR method was used to study the photocatalytic oxidation of carbazole at surface of CdS particle. Carbazole nitroXyl radical was first obtained and its haif period is about 10 ~ 20min , g value is 2.0060. The resuts also show that the production of carbazole nitroxyl radical may be described by degenerated branch chain reaction scheme.