离子注入监测系统的研制

The Development of Ion Implantation Monitor System

本文介绍最新研制成功的离子注入监测系统．由于采用了先进的四探针双位组合测量技术，该系统的功能和技术指标全部满足设计要求，为实现在线检测，改善工艺质量，提高器件成品率发挥了重要的作用。

A new ion implantation monitor system which has been deyeloped recently is introduced in this paper.Its functions and specificationshave all met the design require ments by using four probe combination double seat measuring technique.The system has played an important role in on-line test.improvement of probers and increase ment of finished product rate.