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铁电薄膜和铁电场效应存储器研究 被引量:1

Research on the Ferroelectric Films and Ferroelectric Field Effect Memory
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摘要 简述了铁电场效应管FFET工作原理;说明了器件对薄膜和结构的要求;指出了铁电薄膜的电滞回线及金属铁电半导体结构的C-V特性。 his paper briefly presents the principle of ferroelectric field effect transistors,indi- cates the need of devices to characteristics of ferroelectric films and metal-ferroelectricsemlconduc- tive structure ,and shows the hysterisis loop of the films and C-V curve of MFS structure.
出处 《压电与声光》 CSCD 北大核心 1995年第3期31-34,共4页 Piezoelectrics & Acoustooptics
关键词 铁电薄膜 结构 C-V特性 存储器 铁电场效应 ferroelectric film,structure,C-V characteristic,memory
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  • 1阎培渝,李龙土,张孝文.工艺参数对Sol—Gel法制备的PLZT铁电薄膜结构和性能的影响[J].材料研究学报,1995,9(6):535-538. 被引量:2
  • 2Zhao H J, Ren T L, Zhang N X. Preparation and properties of PLZT thick films on silicon[J]. Mater Sci Eng. 2003. B99: 195-198.
  • 3Elif Ertekin, Jenny Keyani, Asher Sinensky, et al. A capacitor dielectric for 16 Dbit DRAM[J]. Thin Films, 2002, MSE 225: 1-2.
  • 4Lee J S, Kim C I, Yoon D S, et al. Effects of seeding layer on pervoskite transformation, microstructure and transmittance of sol-gel-processed lanthanum-modified lead zirconate titanate films[J].Jpn J Appl Phys, 1994, 33(1): 260-263.
  • 5Kiyotaka Wasa, Toshifumi Satoh, Kenji Tabata,et al. Effects of PLT-buffer layer on microstruetures of sputtered PLZT thin films epitaxially grown on sapphire[J]. J Mater Res, 1994, 9(11): 2959-2962.
  • 6Chi Kong Kwok, Seshu B Desu. Low temperature perovskite formation of lead zirconate titanate thin films by a seeding progress[J]. J Mater Res,1993,8(2): 339-342.
  • 7甘肇强.钛酸镧铅薄膜的介电、铁电性能研究[J].功能材料,2002,33(4):403-404. 被引量:5

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