摘要
用钛吸气方法制备清洁表面净化环形反场箍缩(SWIP-RFP)装置内真空室以及原位壁碳化改善SWIP-RFP装置器壁状态,减少了该装置等离子体中的杂质水平,提高了等离子体性能。
Abstractitanium gettering has been used to prepare clean surface for the vacuum chamber fo the SWIP-RFP device,and in situ will carbonization improve wall condition of the SWIP-RFP device.The impurity radiation has been reduced in the plasma of the SWIP-RFP device,and enhance the plasma behavior
出处
《真空》
CAS
北大核心
1995年第1期25-28,共4页
Vacuum