摘要
日本真空技术株式会社研制的A2K装置可以有效地抑制DC溅射中的异常放电,而这在以往的传统方式DC溅射中是做不到的。在进行易于出现异常放电的溅射成膜时,采用在DC电源上加上A2K的方法,被证明确实有效地减少了异常放电的发生。
Abstract The A2K active arc killer developed by ISM of ULVAC JAPAN,Led,positively inhibits the abnormal discharge that cannot be inhibvited by the conventional DC power supply.Adding the A2K to DC power supply in a sputtering process that is liable to abnolmal discharge,it proves very effective in the reduction of abnormal discharge.
出处
《真空》
CAS
北大核心
1995年第3期9-14,共6页
Vacuum