摘要
本文观察了不同辐射强度的自然日光照射下,对大肠杆菌宿主菌(K12—C600)和工程菌(MM3)在光滑表面(不锈钢)上的存活影响。结果表明,暴露20min日光累积总辐射1.14MJ/m2,宿主菌的存活率为0.02%,工程菌则为0。散射暴露80min,日光累积强度0.90MJ/m2,宿住菌和工程菌的存活率比值为2:1。黑暗环境下,暴露6天对宿主菌采样仍有细菌存活,工程菌暴露2天的存活率为0。可见,无论是日光总辐射,散射辐射还是黑暗环境,宿主菌的抵抗能力都比工程菌强。在含有40μg/ml的氟霉素平皿上测定工程菌*的稳定性,初步测试结果表明,无论是光照还是黑暗环境,该工程菌的质粒都比较稳定。
We observed the effect of solar radiation on the survival of thegenetically engineered
Escherichia coli(E,coli K-12 C600,pMM1085)and the host Escherichia coli(E. coli K 12 C600)on
the smoothstainless steel surface. The result showed that the survival percentagesof the host
E. coli and the engineered E. coli were 0.02% and 0.00%respectively when the direct exposure
to solar radiation was extendedto 20 min. (total radiation dosage:1.14MJ/m2),In the
diffusioncondition, the ratio of the survival percentage between the hostand the engineered E.
coli was 2:1 when exposed for 80 min,In the darkcondition,the engineered E. coli could not be
detected on the exposuretime of 2 days,while the host E. coli could survive for 6 days. It
isevident that the host E. coli survives better than the engineered E.coli in all the conditions
tested,The stability of the geneticallyengineered plasmid was tested on the selective media
containingchloromycetin(40 μg/ml),The preliminary study showed that theengineered plasmid
was stable in all the conditions tested.
出处
《中国微生态学杂志》
CAS
CSCD
1995年第2期27-31,共5页
Chinese Journal of Microecology
关键词
日光辐射
大肠杆菌
基因工程菌
Solar radiation, Genetically engineered
microorganisms,Escherichia coli.