真空蒸发、淀积、溅射、氧化与金属化工艺

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摘要 0605851 PAMOCVD法制备BON和多层TiN/BON薄膜的结构与特性=Structures and properties of BON and multi- layered TiN/BON thin films prepared by PAMOCVD method[刊,英]/D．-C．Lim,G．C．Chen//Electronics Letters．-2003,163(30)．-318-322(E)

出处《电子科技文摘》 2006年第3期33-36,共1页 Sci.& Tech.Abstract

关键词真空蒸发减压蒸发金属化淀积溅射真空沉积

分类号 TN304.05 [电子电信—物理电子学]

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2006年第3期

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