具有纳米氧化层的磁性隧道结的热稳定性研究

Thermal stability of the magnetic tunnel junctions with nano-oxide layers

研究发现在磁隧道结的反铁磁层和被钉扎铁磁层之间插入一层纳米氧化层,可以使磁隧道结的退火温度增加了40℃,即明显地提高了磁隧道结的温度稳定性.通过卢瑟福背散射实验直接观察到产生这一效应的原因是该纳米氧化层有效地抑制了Mn元素在退火过程中的扩散,从而使TMR值在较高的退火温度下得以保持.

The thermal stability is improved in a magnetic tunnel junction with a nano-oxide layer induced between the antiferromagnetic and pinned ferromagnetic layers, in which the annealing temperature is increased about 40℃. By using Rutherford backscattering spectroscopy, it has been found that the interdiffusion of Mn atoms, responsible for the decrease of TMR during the annealing process, is suppressed across such nano-oxide layer.