摘要
综述了介质/金属/介质(dielectric/metal/dielectric,D/M/D)多层透明导电膜材料的特点、制备方法、研究进展与应用现状,重点比较讨论了 ITO/Ag/ITO、ZnS/Ag/ZnS 的膜系结构、光电性能、化学稳定性、热稳定性等特点,以及与国内外的研究差距。ITO/Ag/ITO、ZnS/Ag/ZnS 是目前光电性能最好,且无需引入过渡层的两种 D/M/D膜系,但有关其热稳定性的评价和研究存在不同的观点。用资源丰富、价格便宜、无毒的掺铝氧化锌(ZAO)薄膜取代含有价格昂贵的贵金属铟的掺锡氧化铟(ITO)薄膜,ZAO/Ag/ZAO 膜系结构的设计、薄膜制备、光电性能与 IMI 的对比研究是目前国内外 D/M/D 研究中的热点课题和 D/M/D 发展的主要方向。
The characteristics, manufacturing methods, recent research progress of D/M/D transparent conductive multilayer films and their applications in various fields are reviewed. Photoelectric properties, structural characters, chemical and thermal stability of ITO/Ag/ITO and ZnS/Ag/ZnS multilayer films are emphasized. There are quite different results on the chemical and thermal stability of ITO/Ag/ITO and ZnS/Ag/ZnS multilayer films. The high material cost of ITO limits its application in D/M/D transparent conductive multilayer films. Al-doped ZnO（ZAO） film is the main alternative dielectric layer of ITO, whose producing technology, photoelectric properties and structural character in D/M/D will be the important study focus in D/M/D research.
出处
《材料导报》
EI
CAS
CSCD
北大核心
2005年第8期9-12,共4页
Materials Reports
