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几种紫外薄膜材料的阈值场强分析

Analysis of the Damage Electric Field Strengths for Several Ultraviolet Thin Film Materials
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摘要 采用多光子吸收、雪崩电离模型和多光子吸收与雪崩电离相结合的联合模型计算了几种紫外光学薄膜材料的激光诱导损伤阈值场强,得出雪崩离化模型在紫外部分已不再适用,联合模型的理论结果可用作实验参考.分析了薄膜阈值电场与入射激光频率脉宽的关系,定性地说明了材料带宽与阈值场强的关系. The laser induce damage threshold electric field instensity strengths of different materials used in the ultraviolet region, have been calculated by the model of multiphoton absorption ionization, avalanche model and a combination of the two. Avalanche model can not be used in the ultraviolet region, the result of the combination model can be used as reference. The authors analyze the relations between the laser induce damage electric field strengths to optical thin film and laser frequency, pulse duration. The relations between materials band gap and damage threshold electric field strengths is analyzed.
作者 胡江川 王万录 马平 陈松林
机构地区 成都精密光学工程研究中心 重庆大学数理学院
出处 《重庆大学学报（自然科学版）》 EI CAS CSCD 北大核心 2005年第8期89-91,116,共4页 Journal of Chongqing University
基金 国家863项目资助课题(863-804-2)
关键词 光学薄膜 阈值电场 紫外 optical thin films damage threshold electric field instensity ultraviolet
分类号 O484.4 [理学—固体物理]
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参考文献7

  • 1袁景梅,汤兆胜,齐红基,邵建达,范正修.几种紫外薄膜材料的光学常数和性能分析[J].光学学报,2003,23(8):984-988. 被引量：41
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二级参考文献13

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共引文献40

重庆大学学报（自然科学版）
2005年 第8期

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