超快脉冲激光烧蚀过程中的靶材温度分布

Target Temperature Distribution on Ablation Process with Ultrafast High-Pulse-Rate Lasers

讨论了超快脉冲激光烧蚀靶材时的烧蚀特性及激光频率对温度分布的影响.从包含热源项的导热方程出发,详细研究了在纳秒级脉冲激光作用下单次脉冲和多次脉冲时靶材表面温度的变化规律.结果表明,用超快脉冲激光制膜可以有效地减小烧蚀期间靶材温度的大幅度波动.从而为克服传统PLD制膜技术上的制膜厚度的不均匀及大颗粒粒子的产生从理论上提供了依据.

Based on the heat conduction equation in which the heat source term is considered, the temperature evolvement for single and multi-pulses laser irradiation with the duration in ns order has been discussed. The results show that when using ultrafast high-pulse-rate laser ablates targets, the target temperature fluctuation can be effectively decreased. This provides a theoretical basis to partly overcome the deficiency of traditional PLD technology about the nonuniform of thin film and the production of granule or droplets on thin film.