摘要
通过正交设计试验法研究了微波等离子体化学气相沉积(MPCVD)实验条件对碳氮纳米管薄膜场发射性能的影响.结果表明,当微波功率为1 500 W、反应气压为8.5 kPa、甲烷、氮气和氢气的流量比为8:20:80时,制备的碳氮纳米管薄膜场发射特性最好,其开启电场强度为3.2 V/μm,电场强度为8.0V/μm时的电流密度为3.5 mA/cm2.
The effect of microwave plasma chemical vapor deposition experimental conditions on the field emission property of CNx nanotube films is analyzed by the cross design experiment. The results show that the best field emission property of carbon nitride nanotubes film can be obtained at microwave power 1500 W, reaction pressure 8.5 kPa and the flow rate of CH4:N2:H2 is 8:20:80 cm^3/s. The turn-on field is 3.2 V/μm and the current density is 3.5mA/cm^2 at the field 8.0 V/μm.
出处
《郑州大学学报(工学版)》
CAS
2005年第3期61-64,共4页
Journal of Zhengzhou University(Engineering Science)
基金
教育部科学技术研究重点项目(205091)
关键词
正交设计
碳氮纳米管
场发射
cross design
carbon nitride nanotube
field emission