摘要
采用对靶直流磁控溅射制备的铁镍氧化物薄膜,其电特性、电化学特性和结构与反应溅射过程中氧氩比之间有很大的关系。实验结果表明氧气流量较高时,材料的导电性较好,但过电位较大;反之氧流量较低时,电阻率较大,过电位较小,表面较粗糙。
Iron-nickel oxide films were deposited by DC reactively magnetron sputtered apparatus with two face-to-face targets. The relation among the overpotential, morphology, resistivity, structure character and various oxygen contents was studied. The restdts show that the overpotential increases while the resistivity decreases with increase of the oxygen content.
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
2005年第4期661-665,共5页
Journal of Synthetic Crystals
关键词
铁镍氧化物
对靶磁控溅射
氧含量
过电位
iron-nickel oxide
magnetron sputtering apparatus
oxygen content
overpotential
