摘要
本文采用溶胶-凝胶法在石英玻璃基底上制备出性能优良的ZnO薄膜,并通过XRD和UV-VIS吸收光谱对薄膜的结构及光吸收特性进行表征,进一步研究了退火温度和氧气流量对ZnO薄膜光催化性能的影响。结果表明,本实验中ZnO薄膜光催化降解苯酚的最佳条件是:退火温度在300℃,氧气流量为20ml/min,催化效果显著。
Highly photoactive ZnO thin films have been prepared by sol-gel process on quartz substrates. Structural features and UV absorption spectrum were studied by XRD and UV-VIS scanning spectrophotometer. The influence of annealing temperature and air flux on the degradation rates was also studied. And the results show that annealing temperature of 300℃ and air flux of 20mL/min are the best conditions for the ZnO thin film. An efficient degradation in the phenol of ZnO thin films was found in this experiment.
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
2005年第4期760-763,共4页
Journal of Synthetic Crystals
基金
广州市科技攻关计划资助项目(No.2003Z3-D2011)