杂化聚酰亚胺薄膜耐电晕性能的研究

STUDY ON CORONA-RESISTANCE PROPERTY OF HYBRID POLYIMIDE FILM

用均苯四甲酸二酐和4,4′-二氨基二苯醚合成聚酰亚胺(PI)树脂,以甲基三乙氧基硅烷为无机前驱体原位产生二氧化硅(S iO2)粒子,并以3-氨丙基三乙氧基硅烷为偶联剂制备了PI/S iO2杂化薄膜。分析和讨论了无机成分的含量和两相间界面形态的变化对PI/S iO2薄膜耐电晕性能的影响。结果表明,无机组分的引入对杂化PI/S iO2薄膜的耐电晕性能产生很大的影响,薄膜的耐电晕性能随S iO2含量的增加而提高;偶联剂的引入对无机粒子的分散、两相相容性,以及界面形态具有明显的改善作用,对薄膜耐电晕性能的改善更为明显。并提出了一个耐电晕模型。

A hybrid polyimide/silica （ PI/SiO2 ） film was prepared with pyromellitic dianhydride and 4,4＇-oxydianiline as monomers, with methyl-triethoxysilane as the precursor of the inorganic content producing the particle of silica in-situ and with 3-amin- opropyl-triethoxysiane as coupling agent. The effect of SiO2 content and the morphology between the organic and inorganic phases on corona-resistance （CR） property was analyzed and discussed. Results showed that the inorganic content had evident effects on the CR property of the hybrid film. The CR property of the hybrid film increased as the increase of SiO2 content. The coupling agent could improve the miscibility and interface morphology of the PI/SiO2 composite system clearly, and improve the CR property of the hybrid film in a greater degree. A corona-resistance model was put forward.