表面残留有机沾污物的TOF－SIMS及XPS研究

TOF-SIMS and XPS Studies on Residual Organic Contaminants Remained

飞行时间次级离子质谱（ＴＯＦ－ＳＩＭＳ）结合Ｘ射线光电子能谱（ＸＰＳ）分析了用化学方法清洗后、银片上残留的未知的有机物。结果显示，有机沾污物主要是一些含１８～３０碳原子、碳链饱和度很高的酮类和酯类化合物；个别有机物可能是硬脂酰胺。这种结构特点使有机物中的Ｃ＝Ｏ基团易于采取氧原子指向基体表面的取向，通过带部分负电荷的氧原子与金属基体镜像力的作用而增强粘附。ＴＯＦ－ＳＩＭＳ二维离子像显示有机沾污物在银片表面上呈极稀薄的均匀分布。

The residual organic contaminants remained on sliver foil surface by certain chemical rinse were analyzed by time-of-flight secondary ion mass spectrometry (TOF-SIMS)and X-ray photoelecton spectroscopy(XPS).The results revealed that the contaminants are mainly composed of saturated ketones and esters with 18～30 carbon chain and some steramides.A preferential orientation of C=O groups with oxygen atoms point to the metal substrate may easily occur in such structures,as a result of the interaction between the partially charged oxygen atoms and their mirror images in the substrate and enhanced adhesion. The organic comtaminants are evenly and sparsely dis-tributed on the surface of silver foil.