摘要
利用循环伏安法,通过对比掺硼金刚石薄膜电极和铂/金刚石电极分别作为工作电极时的循环伏安曲线,分析了两种电极表现出的电化学性能差别,并利用能级理论进行了机理探讨。结果表明掺硼金刚石薄膜电极具有宽的电化学窗口(宽度约为3V)、良好的化学稳定性和极低的背景电流(接近0),是一种较有潜力的电化学电极材料。
By cyclic vohammetry, electrochemical properties of the boron-doped diamond thin-film electrode were investigated compared with those of Pt/BDD electrode. It shows that the boron-doped diamond thin-film electrode has wide electrochemical window （approximate 3V）, excellent chemical sta- bility and low background current （near zero ）. At the same time, the result was analyzed with energy level theory. All the works show that the boron-doped diamond thin film is a kind of ideal potential electrode.
出处
《功能材料与器件学报》
EI
CAS
CSCD
北大核心
2005年第3期295-298,共4页
Journal of Functional Materials and Devices
基金
上海科委项目(No.0123nm023)
关键词
掺硼金刚石薄膜电极
铂/金刚石电极
电化学性能
循环伏安法
boron-doped diamond thin-film electrode
Pt/BDD electrode
electrochemical properties
cyclic vohammetry
